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Cylindrical Ag alloy sputtering target

Cylindrical target has an advantage of high utilization efficiency over 80%, in the rotating sputtering process. Therefore, it has been attracting remarkable attentions in recent years.

Mitsubishi Materials is capable of providing seamless long-sized Ag cylindrical target and also Ag alloy cylindrical target with controlled fine and uniform microstructure, which is able to make uniform film deposition onto large substrates. Please contact us if you are looking for a way to improve productivity of sputtering process for large-size substrates, such as Low-E glass, thin film solar cells, and flat panel displays.

Cylindrical target

Our recycling process of silver from used targets is explained in the next page.

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